Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports
Patent
1996-05-29
1998-05-19
Anderson, Bruce
Radiant energy
Inspection of solids or liquids by charged particles
Analyte supports
25244211, 25249221, H01J 37317
Patent
active
057539235
ABSTRACT:
An ion injection device is provided which permits ion injection into a wafer with an optimum ion beam injection angle, and the ion injection device is characterized, by the provision of a wafer holding means for holding a wafer into which ion beam taken out from an ion source is implanted; a relative position varying means for varying the relative position between the wafer holding means and the ion beam within a plane substantially perpendicular to the direction of the ion beam; and an incidence angle varying means for varying an incidence angle of the ion beam on the surface of the wafer held on the wafer holding means. More specifically, the wafer holding means is a rotatable disk which holds a plurality of wafers on the circumference thereof, and the relative position varying means is constituted by a rotating means which causes the rotatable disk to rotate in a plane substantially perpendicular to the direction of the ion beam and by a rocking means for rocking the rotatable disk in a plane substantially perpendicular to the direction of the ion beam.
REFERENCES:
patent: 3993018 (1976-11-01), Kranik et al.
patent: 4453080 (1984-06-01), Berkowitz
patent: 4705951 (1987-11-01), Layman et al.
patent: 4733087 (1988-03-01), Narita et al.
patent: 4745287 (1988-05-01), Turner
patent: 4817556 (1989-04-01), Mears et al.
patent: 5126571 (1992-06-01), Sakai
patent: 5180918 (1993-01-01), Isobe
patent: 5218209 (1993-06-01), Taskeyama
patent: 5357115 (1994-10-01), Asakawa et al.
patent: 5393984 (1995-02-01), Glavish
patent: 5478195 (1995-12-01), Usami
Fujimoto Minoru
Hashimoto Isao
Ishiguro Kouji
Mera Kazuo
Yamashita Yasuo
Anderson Bruce
Hitachi , Ltd.
LandOfFree
Ion injection device and method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ion injection device and method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion injection device and method therefor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1855230