Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1996-08-01
1997-11-04
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430311, 1566431, G03C 516, B44C 122
Patent
active
056838573
ABSTRACT:
A method for forming a resist pattern which comprises irradiating an active light ray to a resist obtained by coating a photosensitive resin composition containing a compound capable of generating an acid due to irradiation of the active light ray and a silyloxy compound in a binder resin on a substrate through a pattern mask to decompose the silyloxy compound due to the acid generated at the irradiation region to form a silanol compound, and after removing the silanol compound, removing a film at the photosensitive region due to an oxygen plasma, a removal of said silanol compound being conducted by bringing the film after irradiation of the active light ray into contact with volatile organic solvent vapor having a boiling photosensitive composition.
REFERENCES:
patent: 5068169 (1991-11-01), Takechi et al.
patent: 5108875 (1992-04-01), Thackeray et al.
patent: 5286595 (1994-02-01), Hertler et al.
patent: 5326670 (1994-07-01), Kotachi et al.
patent: 5346803 (1994-09-01), Crivello et al.
patent: 5391441 (1995-02-01), Imai et al.
Yamaoka et al., Polymer Engineering and Science, vol. 29, No. 13, "A Novel Positive Resist for Deep UV Lithography", Mid-Jul., 1992, pp. 856-858.
Aoai et al., J. Photopolym. Sci. Technol., vol. 3, No. 3, "Application of Silylether and Silylester Polymer for Chemical Amplification System", 1990, pp. 389-400.
Nishijima Kanji
Shirai Masamitsu
Tsunooka Masahiro
Codd Bernard P.
Lesmes George F.
Nippon Paint Co. Ltd.
LandOfFree
Method for forming resist pattern by irradiating a resist coatin does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming resist pattern by irradiating a resist coatin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming resist pattern by irradiating a resist coatin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1832106