Linearly polarized X-ray patterning process

Details Linearly polarized X-ray patterning process Linearly polarized X-ray patterning process

1985-10-22

1987-10-20

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 378145, G21K 500

Patent

active

047019409

ABSTRACT:
A process of X-Y lithography including providing a linearly polarized X-ray, and irradiating a resist on a substrate through a mask with the linearly polarized X-ray to form a pattern shape which is utilized for production of, for example, a semiconductor device or magnetic bubble memory device.

REFERENCES:
patent: 3944822 (1976-03-01), Dzubay
patent: 4028547 (1977-06-01), Eisenberger
patent: 4320936 (1982-03-01), Sawamura
patent: 4370194 (1983-01-01), Shaver et al.
patent: 4467026 (1984-08-01), Ogawa

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