X-Ray exposure apparatus

Details X-Ray exposure apparatus X-Ray exposure apparatus

1982-04-13

1983-09-06

Willis, Davis L.

X-ray or gamma ray systems or devices

Specific application

Lithography

G03B 4116

Patent

active

044033362

ABSTRACT:
An X-ray exposure apparatus making use of a soft X-ray. An atmospheric chamber charged with a gas having a high permeability to X-ray is disposed between the X-ray source and the mask having the pattern to be replicated, such that the mask is supported by the atmospheric chamber. A part or the whole of an alignment optical system is disposed in the atmospheric chamber. According to this arrangement, it is possible to decrease the rate of attenuation of the X-ray between the source and the mask to attain higher ratio of utilization of the generated X-ray, thereby to shorten the replicating time and to improve the through put (amount of replication per unit time).

REFERENCES:
patent: 4119855 (1978-10-01), Bernacki
patent: 4185202 (1980-01-01), Dean et al.

Affiliated with

Also associated with

Rating

X-Ray exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X-Ray exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-Ray exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1595574