Method for designing cell array layout of non-volatile memory de

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

716 19, 438256, 438587, 257315, 257316, G06F 1700

Patent

active

06056783&

ABSTRACT:
There is provided a method for designing a cell array layout of a non-volatile memory device which facilitates a contact hole process and contributes to the reduction of chip size, by modifying a layout of active contact holes. In the method, the distance between active regions are uniformly maintained in all cells by forming a second active line over a active contact region. Therefore, variations, caused by microloading effects when patterning active regions, of the width of active regions in some cell strings can be prevented. Operational failure of a cell caused by variations in the coupling ratio can be prevented, as well.

REFERENCES:
patent: 5183781 (1993-02-01), Nakan
patent: 5317534 (1994-05-01), Choi et al.
patent: 5326999 (1994-07-01), Kim et al.
patent: 5379233 (1995-01-01), Tripaohi et al.
patent: 5392237 (1995-02-01), Iida
patent: 5426608 (1995-06-01), Higashitani
patent: 5465249 (1995-11-01), Cooper, Jr. et al.
patent: 5497345 (1996-03-01), Cappelletti
patent: 5557569 (1996-09-01), Smayling et al.
patent: 5640031 (1997-06-01), Keshtbod
patent: 5656527 (1997-08-01), Choi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for designing cell array layout of non-volatile memory de does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for designing cell array layout of non-volatile memory de, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for designing cell array layout of non-volatile memory de will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1590936

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.