Photopatternable dielectric compositions, method for making and

Details Photopatternable dielectric compositions, method for making and Photopatternable dielectric compositions, method for making and

1985-01-28

1986-05-06

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430311, 430330, G03C 516, G03F 726

Patent

active

045872040

ABSTRACT:
There is provided a photosensitive modified silicone-aromatic polyamide acid convertible to a patterned silicone-polyimide. A silicone-polyamide acid is modified with an isocyanatoalkylacrylate to produce a silicone-aromatic polyamide acid having acrylate alkylamide groups attached to the silicone-aromatic polyamide acid backbone by nitrogen-nuclear bound carbon linkages.

REFERENCES:
patent: 4017340 (1977-04-01), Yerman
patent: 4321319 (1982-03-01), Shoji et al.

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