Fishing – trapping – and vermin destroying
Patent
1992-03-04
1993-04-20
Hearn, Brian E.
Fishing, trapping, and vermin destroying
437235, 437236, 437240, 437247, 437982, 148DIG133, H01L 21465
Patent
active
052042880
ABSTRACT:
A planarizing process for planarizing an integrated circuit structure in a CVD apparatus is disclosed using a low melting inorganic planarizing material which comprises flowing white depositing a low melting inorganic planarizing layer such as a boron oxide glass over a layer of insulating material such as an oxide of silicon, then dry etching the low melting inorganic planarizing layer to planarize the structure, and then depositing a further layer of an insulating material to encapsulate any remaining portions of the low melting glass planarizing layer which may be hygroscopic. The method eliminates the need for separate coating, drying, and curing steps associated with the application of organic-based planarizing layers usually carried out outside of a vacuum apparatus. In a preferred embodiment, the deposition steps and the etching step are all carried out without removing the integrated circuit structure from the apparatus. In a particularly preferred embodiment, all of the steps are carried out in the same chamber of the apparatus. An additional etching step may be carried out after depositing the first insulating layer and prior to deposition of the planarizing layer to remove any voids formed in the insulating layer.
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Law Kam S.
Marks Jeffrey
Maydan Dan
Wang David N.
Applied Materials Inc.
Hearn Brian E.
Nguyen Tuan
Taylor John P.
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