Process for forming a pattern using a photosensitive azide and a

Details Process for forming a pattern using a photosensitive azide and a Process for forming a pattern using a photosensitive azide and a

1989-05-23

1991-06-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430195, 430197, G03C 500, G03C 1695, G03F 7012

Patent

active

050249207

ABSTRACT:
This invention relates to a process for forming a pattern using a photosensitive composition comprising a polymeric azide and a high-molecular weight copolymer or polymer. The photosensitive composition comprises a copolymer containing at least a water-soluble non-photosensitive monomeric unit having an electrolytic functional group, a monomeric unit having an azido group and an electrolytic functional group and a high-soluble high molecular weight copolymer or polymer which exhibits reciprocity law failure characteristic.

REFERENCES:
patent: 2948610 (1960-08-01), Merrill et al.
patent: 3917794 (1975-01-01), Akagi et al.
patent: 4086090 (1978-04-01), Kohashi et al.
patent: 4241162 (1980-12-01), Hatano et al.
patent: 4332874 (1982-06-01), Hayashi et al.

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