Chemical vapor deposition apparatus

Details Chemical vapor deposition apparatus Chemical vapor deposition apparatus

1983-08-31

1985-09-10

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

Multizone chamber

118724, 118725, 118733, 118728, C23C 1308

Patent

active

045399336

ABSTRACT:
An improved chemical vapor deposition device having heating means substantially surrounding an inner deposition chamber for providing isothermal or precisely controlled gradient temperature conditions therein. The internal components of the chamber are quartz or similar radiant energy transparent material. Also included are special cooling means to protect thermally sensitive seals, structural configurations strengthening areas of glass components subjected to severe stress during operation, and specific designs permitting easy removal and replacement of all glass components exposed to deposition gas.

REFERENCES:
patent: 3233578 (1966-02-01), Capita
patent: 3293074 (1966-12-01), Nickl
patent: 3441000 (1969-04-01), Burd et al.
patent: 3456616 (1969-07-01), Gleim et al.
patent: 3675619 (1972-07-01), Burd
patent: 3704987 (1972-12-01), Arndt et al.
patent: 3918396 (1975-11-01), Dietze et al.
patent: 4309240 (1982-01-01), Zaferes
patent: 4348580 (1982-09-01), Drexel

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