Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1998-03-31
2000-03-28
Chaudhari, Chandra
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438290, H01L 218246
Patent
active
06043127&
ABSTRACT:
A method of manufacture for a multiple stage ROM unit capable of coding the multiple stages with a single coding implantation and a method of manufacturing the same.
The ROM includes a semiconductor substrate covered by an insulating layer. A gate structure is provided above the insulating layer. A channel region is located on the substrate beneath the gate structure. Source/drain regions are disposed on the semiconductor substrate on each side of the channel region. A cap partially covers the top of the gate structure so as to divide the channel region therebelow into a first channel region and a second channel region such that multiple-level threshold voltages may be coded in the ROM.
REFERENCES:
patent: 5091329 (1992-02-01), Bekkering et al.
patent: 5278078 (1994-01-01), Kanebako et al.
patent: 5378647 (1995-01-01), Hong
patent: 5668029 (1997-09-01), Huang et al.
Chaudhari Chandra
United Microelectronics Corp.
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