Method of monitoring a process of manufacturing a semiconductor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

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438 14, 438398, H01L 218242

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active

061107778

ABSTRACT:
A method of monitoring a process of manufacturing a semiconductor wafer including an area of hemispherical grain polysilicon, the method comprising providing a probe including a liquid conductor; and performing a capacitance-voltage measurement with the probe, using a quasi-static measurement method, to determine capacitance-voltage characteristics at the area of hemispherical grain polysilicon.

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Wantanabe et al., "A New Cylindrical Capacitor Using HSG-SI for 256 Mb DRAMs", IEDM 259-262, 1992.

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