Photoresists which are suitable for producing sub-micron size st

Details Photoresists which are suitable for producing sub-micron size st Photoresists which are suitable for producing sub-micron size st

1995-02-09

2000-08-29

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430176, 4302711, 4302731, 430325, 430326, 430910, 522153, G03C 173

Patent

active

061106372

ABSTRACT:
A photoresist suitable for the production of structures in the submicron range contains the following components:

REFERENCES:
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patent: 4508812 (1985-04-01), Brault
patent: 4680244 (1987-07-01), Lehmann et al.
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patent: 4912018 (1990-03-01), Osuch et al.
patent: 5071730 (1991-12-01), Allen et al.
patent: 5120629 (1992-06-01), Bauer et al.
patent: 5384220 (1995-01-01), Sezi et al.
Ito, H. and M. Ueda, "Thermolysis and Photochemical Acidolysis of Selected Polymethacrylates", Macromolecules, 1988, 21, 1475-1482.
English Translation of JP 53-81116.
EP 0 388 484, Sebald et al. English Translation, Sep. 1990.
EP 394,740--Sezi et al. English Translation Oct. 1990.

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