Photoresist film for deep ultra violet and method for forming ph

Details Photoresist film for deep ultra violet and method for forming ph Photoresist film for deep ultra violet and method for forming ph

1997-05-28

1999-03-30

Cameron, Erma

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

427493, G03C 173, B05D 306

Patent

active

058886982

ABSTRACT:
A photoresist film superior in etch resistance and PED stability, as well as transmittance to deep UV, having a backbone of polymethylmethacrylate grafted with piperidine moiety of which the nitrogen atom acts as a base.

REFERENCES:
patent: 4283509 (1981-08-01), Zweifel et al.
patent: 5334485 (1994-08-01), Van Iseghem et al.

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