Method for etching silicon nitride

Details Method for etching silicon nitride Method for etching silicon nitride

1988-03-31

1989-08-15

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156653, 156657, 1566591, 20419237, 252 791, 437241, B44C 122, C03C 1500, C03C 2506

Patent

active

048571407

ABSTRACT:
A process for etching silicon nitride which utilizes free radicals from a remote plasma generated using a fluorine containing gas; and hydrogen; to produce an etch which is selective to selected materials, for example, silicon and silicon dioxide.

REFERENCES:
patent: 4568410 (1986-02-01), Thornquist
patent: 4615756 (1986-10-01), Tsujii et al.
patent: 4687544 (1987-08-01), Bersin
patent: 4711698 (1987-12-01), Douglas

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