Chemical vapor deposition wafer boat

Details Chemical vapor deposition wafer boat Chemical vapor deposition wafer boat

1984-07-06

1985-10-22

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

Work support

118500, 118732, C23C 1100

Patent

active

045481598

ABSTRACT:
A chemical vapor deposition wafer boat for polysilicon deposition in a vertical CVD apparatus comprises upper and lower, mutually engaging, open ended hemicylinders. Gas flow passageways are present in a diffusion zone of the lower hemicylinder wall, but not in the remainder of the walls of the hemicylinder. Gas flow to the wafers is limited to diffusion flow, and the wafers are protected from particulates forming in the gas stream during the coating operation.

REFERENCES:
patent: 3660179 (1972-05-01), Desmond et al.
patent: 3819067 (1974-06-01), Hammond
patent: 4098923 (1978-07-01), Alberti et al.
patent: 4466381 (1984-08-01), Jenkins

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