Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1994-07-13
1995-03-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430166, 430190, 430193, 430313, 430317, 430326, G03F 730, G03F 736, G03F 7023
Patent
active
053994620
ABSTRACT:
A method is provided for forming a microlithographic relief image having a width of less than one half micron in a bilayer resist composition. The resist composition comprises a single component, silicon-containing photoimageable layer and a polymeric underlayer having a high optical density and a refractive index similar to the refractive index of the overlaying resist. The method provides for the formation of a relief image in the top layer using an i-line (365 nm) or deep ultra violet (170 to 300 nm) light source, followed by O.sub.2 RIE transfer of the relief image into the polymeric underlayer.
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Jagannathan Premlatha
Lang Robert N.
Sachdev Harbans S.
Sachdev Krishna G.
Sooriyakumaran Ratnam
Bowers Jr. Charles L.
Chu John S.
Crockatt Dale M.
International Business Machines - Corporation
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