Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-01-13
1998-08-18
Wallace, Valencia
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257296, 257306, 257310, 438 2, 438 3, 438240, 438396, H01L 27108
Patent
active
057961336
ABSTRACT:
In a semiconductor device having a ferroelectric capacitor and manufacturing method thereof, a spacer comprising a low dielectric material is formed on the side surfaces of a plurality of lower electrodes separated into each cell unit, and a ferroelectric film is formed on the lower electrodes whereon the low dielectric material spacer is formed, and an upper electrode is formed on the ferroelectric film, to thereby prevent an error which may be caused between the adjacent lower electrodes.
REFERENCES:
patent: 5198384 (1993-03-01), Dennison
patent: 5206788 (1993-04-01), Larsen et al.
patent: 5439840 (1995-08-01), Jones, Jr. et al.
patent: 5543644 (1996-08-01), Abt et al.
Kang Chang-seok
Kwon Kee-Won
Samsung Electronics Co,. Ltd.
Wallace Valencia
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