X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1992-05-05
1993-06-15
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378145, G21K 500
Patent
active
052205908
ABSTRACT:
Optimum solutions for three-mirror lenses for projection lithography cameras using X-ray radiation to image a mask on a wafer are represented as single points within regions of two-dimensional magnification space defined by the magnification of a convex mirror as one coordinate and the ratio of the magnifications of a pair of concave mirrors optically on opposite sides of the convex mirror as another coordinate. Lenses within region 30, 50, and preferably within region 40, 60, of such magnification space represent potential solutions that are optimizable by standard computer optical design programs and techniques to achieve extremely low distortion lenses having a resolution of about 0.1 micron or less.
REFERENCES:
"Soft x-ray reduction lithography using multilayer mirrors" by H. Kinoshita et al., J. Vac. Sci. Technol. B7(6), Nov./Dec. 1989, pp. 1648.sub.]1651.
"Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 .mu.m" by J. E. Bjorkholm et al., J. Vac. Sci. Technol. B8(6), Nov./Dec. 1990, pp. 1509-1513.
"High-Precision Soft X-Ray Optics", Proceedings of Workshop, Oct. 5-6, 1989, section on Optical Fabrication, pp. 16-20.
"Design and Analysis of Multimirror Soft-X-Ray Projection Lithography Systems" by D. L. Shealy et al., OSA Proceedings on Soft-X-Ray Projection Lithography, 1991, vol. 12, Jeffrey Bokor (ed.), Optical Society of America, pp. 22-26.
"Optics Development for Soft X-Ray Projection Lithography Using a Laser Plasma Source" by R. H. Stulen et al., Nov. 15, 1990, OSA Proceedings on Soft-X-Ray Projection Lithography, 1991, vol. 12, Jeffrey Bokor (ed.), Optical Society of America, pp. 54-57.
"Design survey of x-ray/XUV projection lithography systems" by D. L. Shealy et al., SPIE Advent Technology Series, vol. AT2, Summer/Fall 1990, (ed., Western Washingon University), SPIE Optical Engineering Press, pp. 320-331.
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"20:1 Projection Soft X-ray Lithography Using Tri-level Resist" by T. E. Jewell et al., 1263-34, 5 pages.
"Optical imaging for microfabrication" by J. H. Bruning, J. Vac. Sci. Technol., 17(5), Sep./Oct. 1980, American Vacuum Society, pp. 1147-1155.
"Reflection Mask Technology for X-Ray Projection Lithography", by A. M. Hawrylak et al., presented at 33rd International Conference on Electron, Ion and Photon Beam Technology, May 31, 1989; to be published in J. Vac. Sci. Technol., Nov./Dec. 1989, pp. 1-12.
Bruning John H.
Phillips, Jr. Anthony R.
Shafer David R.
White Alan D.
Church Craig E.
General Signal Corporation
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