Production of resist images, and a suitable dry film resist

Details Production of resist images, and a suitable dry film resist Production of resist images, and a suitable dry film resist

1984-11-27

1987-03-10

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430286, 430283, 430285, 430284, 430330, 430945, 430312, 430394, 430327, 430944, 156643, G03C 1495, G03C 516, G03F 726

Patent

active

046491007

ABSTRACT:
In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.

REFERENCES:
patent: 3782939 (1974-01-01), Bonham et al.
patent: 3857860 (1974-09-01), Ross et al.
patent: 4164458 (1979-08-01), Patel
patent: 4193797 (1980-03-01), Cohen et al.
patent: 4220747 (1980-09-01), Preziosi et al.
patent: 4262073 (1981-04-01), Pampalone et al.
patent: 4314021 (1982-02-01), O'Brien et al.
patent: 4562141 (1985-12-01), Tieke
Copy of European Search Report EP 84 11 4104.
Journal of Polymer Science: Polymer Ltrs. Ed., vol. 16, 607-614, (1978).
Journal of Chem. Phys. 70, 4387-4392 (1979).
Journal of Polymer Science Polymer Letters Edition, vol. 17, 203-208, (1979).
Makromol Chem., Rapid Commun. 3,231-3,237, 3,815-3,819, 3,249-3,254, (1982).

Affiliated with

Also associated with

Rating

Production of resist images, and a suitable dry film resist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Production of resist images, and a suitable dry film resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of resist images, and a suitable dry film resist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1021681