4. Coating apparatus
  5. Gas or vapor deposition
  6. Running length work

Yoshiki Aruga

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Compact in-line film deposition system

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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In-line film deposition system

Coating apparatus – Gas or vapor deposition – Running length work
Patent

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Main valve

Valves and valve actuation – Pivoted valves
Patent

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Method of removing accumulated films from the surface of...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate

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Profile ID: LFUS-PAI-P-328123

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