In-line film deposition system

Details In-line film deposition system In-line film deposition system

1996-02-22

1998-12-08

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Running length work

118719, 118729, 118730, 20429825, 20429835, 156345, 414935, 414937, 414939, C23C 1600, C23C 1456

Patent

active

058463283

ABSTRACT:
An in-line film deposition system is adapted so that film deposition processing on a substrate is completed through a number of film deposition processes, while the length of the system is not excessive. A carrier 3 which holds two substrates 1, with their planar surfaces set parallel to a transfer direction, is sequentially transferred through a plurality of vacuum chambers 2 arranged along a polygonally-shaped transfer path 30. Film deposition processing is continuously carried out on the substrate 1 by processing means 4 that are arranged in the vacuum chambers 2 which form film deposition process chambers. A rotation mechanism for rotating the carrier 3 through a specified angle so as to direct the carrier 3 in a subsequent transferring direction is provided in those vacuum chambers which are located at turning points along the polygonal transfer path 30.

REFERENCES:
patent: 2730987 (1956-01-01), Nelson
patent: 4500407 (1985-02-01), Boys et al.
patent: 4722298 (1988-02-01), Rubin et al.
patent: 4981408 (1991-01-01), Hughes et al.
patent: 5024570 (1991-06-01), Kiriseko et al.
patent: 5047130 (1991-09-01), Akao et al.
patent: 5076205 (1991-12-01), Vowles et al.
patent: 5288329 (1994-02-01), Nakamura et al.
patent: 5377816 (1995-01-01), Deligi et al.
patent: 5379212 (1995-01-01), Saiki
patent: 5651868 (1997-07-01), Canady et al.
patent: 5695564 (1997-12-01), Imahashi
Anelva, Disk Sputtering System C-3010, New Product, Aug. 1995.

Affiliated with

Also associated with

Rating

In-line film deposition system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with In-line film deposition system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and In-line film deposition system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-172985