4. Organic compounds -- part of the class 532-570 series
  5. Organic compounds
  6. Oxygen containing

Yoshihide Senzaki

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Atomic layer deposition of hafnium-based high-k dielectric

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Chemical vapor deposition of iron, ruthenium, and osmium

Coating processes – Coating by vapor – gas – or smoke – Metal coating
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Chemical vapor deposition of iron, ruthenium, and osmium

Coating processes – Direct application of electrical – magnetic – wave – or... – Photoinitiated chemical vapor deposition
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Deposition and annealing of multicomponent ZrSnTi and HfSnTi...

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate

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Liquid precursor mixtures for deposition of multicomponent...

Coating processes – Heat decomposition of applied coating or base material
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Profile ID: LFUS-PAI-P-586496

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