Chemical vapor deposition of iron, ruthenium, and osmium

Details Chemical vapor deposition of iron, ruthenium, and osmium Chemical vapor deposition of iron, ruthenium, and osmium

1992-07-28

1994-05-24

Bell, Janyce

Coating processes

Direct application of electrical, magnetic, wave, or...

Photoinitiated chemical vapor deposition

427252, 4272553, 427294, 427585, 427586, B05D 306

Patent

active

053147278

ABSTRACT:
A method is provided for forming films comprising Fe, Ru or Os employing the techniques of chemical vapor deposition to decompose a vapor comprising an organometallic compound of the formula (a): (CO).sub.4 ML or (b): M.sub.2 [.mu.-.eta.:.eta..sup.4 -C.sub.4 ](CO).sub.6 ; wherein L is a two-electron donor ligand and each R is H, halo, OH, alkyl, perfluoroalkyl or aryl; so as to deposit a coating comprising one or more of said metals on the surface of a substrate.

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