4. Etching a substrate: processes
  5. Nongaseous phase etching of substrate
  6. Etching inorganic substrate

Yong-sun Ko

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Adjustable selectivity etching solutions and methods of etching

Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Patent

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Apparatus for drying semiconductor wafers using isopropyl alcoho

Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
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Aqueous cleaning solution for removing contaminants surface...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate

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Chemical mechanical polishing methods utilizing pH-adjusted poli

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cleaning solutions for removing contaminants from the...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-201256

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