4. Single-crystal, oriented-crystal, and epitaxy growth processes;
  5. Forming from vapor or gaseous state
  6. With decomposition of a precursor

Yogesh K. Vohra

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Apparatus and method for diamond production

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having growth from a solution comprising a solvent which is...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Apparatus and method for diamond production

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Apparatus and method for diamond production

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

High growth rate homoepitaxial diamond film deposition at high t

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Process for ultra smooth diamond coating on metals and uses...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Yogesh K. Vohra does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Yogesh K. Vohra, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Yogesh K. Vohra will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-1430075

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure