4. Coating apparatus
  5. Gas or vapor deposition
  6. Running length work

Yasunori Kin

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Plasma CVD method and plasma CVD apparatus

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Vacuum deposition apparatus

Coating apparatus – Gas or vapor deposition – Running length work
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Profile ID: LFUS-PAI-P-692650

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