Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
Inventor
active
End-block for a rotatable target sputtering apparatus
Erosion compensated magnetron with moving magnet assembly
Magnetron with parallel race track and modified end portions...
Planar magnetron with moving magnet assembly
Rotatable sputter target
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Profile ID: LFUS-PAI-P-2153415