4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

William J. Durbin

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Plasma enchanced chemical method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Plasma enhanced chemical processing reactor

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Plasma enhanced chemical processing reactor and method

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Plasma enhanced chemical processing reactor and method

Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate

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