4. Coating processes
  5. Coating by vapor, gas, or smoke
  6. Mixture of vapors or gases utilized

Vladislav Y. Vassiliev

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Method of fluorinated silicon oxide film deposition

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Patent

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Method of silicon oxide and silicon glass films deposition

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Method to form shallow trench isolation structures with improved

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Patent

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Profile ID: LFUS-PAI-P-646631

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