4. Radiation imagery chemistry: process, composition, or product th
  5. Imaging affecting physical property of radiation sensitive...
  6. Making electrical device

Vladimir Starov

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Controlling resolution of exposed resist in device lithography

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
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Method and apparatus for removing post-etch residues and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging
Reexamination Certificate

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Method and apparatus for removing post-etch residues and...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate

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Method and apparatus for sealing substrate load port in a...

Coating apparatus – Gas or vapor deposition – Chamber seal
Reexamination Certificate

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Method for removing photoresist and other adherent materials fro

Cleaning and liquid contact with solids – Processes – Including regeneration – purification – recovery or separation...
Patent

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Profile ID: LFUS-PAI-P-1132519

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