4. Radiant energy
  5. With charged particle beam deflection or focussing
  6. With detector

Valentin N. Todorov

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Apparatus for measuring plasma characteristics within a semicond

Radiant energy – With charged particle beam deflection or focussing – With detector
Patent

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Plasma reactor with dynamic RF inductive and capacitive...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
Reexamination Certificate

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Process chamber having a voltage distribution electrode

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
Reexamination Certificate

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Process for wafer backside polymer removal with a ring of...

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Tandem etch chamber plasma processing system

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means
Reexamination Certificate

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Profile ID: LFUS-PAI-P-469480

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