4. Coating processes
  5. Measuring, testing, or indicating
  6. Thickness or uniformity of thickness determined

Tsuyoshi Horikawa

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Chemical vapor deposition apparatus

Coating apparatus – Gas or vapor deposition
Patent

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Chemical vapor deposition apparatus and a method of...

Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Reexamination Certificate

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Chemical vapor deposition apparatus and a method of...

Semiconductor device manufacturing: process – Gas flow control
Reexamination Certificate

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CVD apparatus for forming thin film having high dielectric...

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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High dielectric constant thin film structure method for forming

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Patent

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Profile ID: LFUS-PAI-P-202875

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