4. Gas separation: processes
  5. Filtering

Tetsuzo Ueda

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Compound gas injection system

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
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Compound gas injection system and methods

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
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Cubic nitride semiconductor device and fabrication method of...

Stock material or miscellaneous articles – Composite – Of inorganic material
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Detached and inverted epitaxial regrowth & methods

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
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Dual process semiconductor heterostructures

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With heterojunction
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Profile ID: LFUS-PAI-P-200258

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