4. Semiconductor device manufacturing: process
  5. Formation of electrically isolated lateral semiconductive...
  6. Recessed oxide by localized oxidation

Takuo Ohashi

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Fabrication process for a semiconductor device

Semiconductor device manufacturing: process – Gettering of substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Manufacturing method for semiconductor device and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Manufacturing method of semiconductor device and oxidization...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Semiconductor device and method for producing same

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Semiconductor device and method for producing same

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Takuo Ohashi does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Takuo Ohashi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Takuo Ohashi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2025391

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure