4. Coating apparatus
  5. Gas or vapor deposition

Takeshi Yokouchi

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Gas supply system, substrate processing apparatus and gas...

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Pressure control method and processing device

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Pressure control method and processing device

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2393721

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