Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2005-04-11
2009-06-30
Olsen, Allan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
Reexamination Certificate
active
07553773
ABSTRACT:
First and second pressure sensors132and134that perform pressure detection over different pressure detection ranges from each other detect the pressure within a process chamber102of an etching device100. A pressure controller144selects optimal pressure data in correspondence to the pressure inside the process chamber from the pressure data provided by the first and second pressure sensors132and134. It also analyzes the selected pressure data at a resolution selected in correspondence to the pressure inside the process chamber102and thus obtains pressure data achieving a predetermined data density. The pressure controller134controls a pressure control valve130so as to ensure that the pressure data match preset pressure data.
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English Translation of International Preliminary Examination Report, Feb. 7, 2002.
Hirose Eiji
Iwabuchi Noriyuki
Suzuki Shingo
Yokouchi Takeshi
Finnegan Henderson Farabow Garrett & Dunner LLP
Olsen Allan
Tokyo Electron Limited
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