4. Coating processes
  5. Direct application of electrical, magnetic, wave, or...
  6. Plasma

Takeshi Kashiro

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Method for formation of multilayer film

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent

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Method of forming a polycrystalline silicon layer, a thin film t

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent

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Profile ID: LFUS-PAI-P-318563

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