4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Tadashi Gondai

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Plasma procesor and plasma processing method

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Plasma processing method, plasma processing apparatus and...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-3202096

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