4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Syouzou Watanabe

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Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate
Reexamination Certificate

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Vacuum plasma processing apparatus and method

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Profile ID: LFUS-PAI-P-667455

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