Vacuum plasma processing apparatus and method

Details Vacuum plasma processing apparatus and method Vacuum plasma processing apparatus and method

1995-02-15

1997-03-11

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723ER, C23C 1600

Patent

active

056096909

ABSTRACT:
A vacuum plasma processing apparatus includes a vacuum processing container accommodating a to-be-processed substrate, a feeding device for feeding a reaction gas to the container, a vacuumizing device for discharging a gas in the container therefrom, a susceptor for holding the to-be-processed substrate arranged in the container, split electrodes arranged in a deltaic lattice at a wall surface of the container facing the to-be-processed substrate, and a power source unit for impressing to the slit electrodes three-phase RF powers having three phases different from each other. When the electrodes are arranged in an orthogonal lattice at the wall surface of the continuer, the power source unit impresses thereto two-phase RF powers having two phases different from each other.

REFERENCES:
patent: 5330606 (1994-07-01), Kubota et al.
patent: 5424905 (1995-06-01), Nomura et al.

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