4. Coating apparatus
  5. Condition responsive control
  6. Valve actuator

Sven Lindfors

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ALD reactor and method with controlled wall temperature

Coating processes – Coating by vapor – gas – or smoke – Plural coatings applied by vapor – gas – or smoke
Reexamination Certificate

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Method and apparatus for growing thin films

Coating apparatus – Program – cyclic – or time control – Having timer
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Method and apparatus of growing a thin film

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate

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Method and apparatus of growing a thin film onto a substrate

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state
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Method and equipment for growing thin films

Coating apparatus – Condition responsive control – Valve actuator
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Profile ID: LFUS-PAI-P-552058

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