4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Sudipto R. Roy

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Horizontal reactor hardware design

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Self-siphoning CMP tool design for applications such as...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – For liquid etchant
Reexamination Certificate

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Profile ID: LFUS-PAI-P-385305

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