4. Coating apparatus
  5. With vacuum or fluid pressure chamber

Subhadra Gupta

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Linear sweeping magnetron sputtering cathode and scanning...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Process equipment with simultaneous or sequential deposition and

Coating apparatus – With vacuum or fluid pressure chamber
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Stable high rate reactive sputtering

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-917812

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