Linear sweeping magnetron sputtering cathode and scanning...

Details Linear sweeping magnetron sputtering cathode and scanning... Linear sweeping magnetron sputtering cathode and scanning...

2006-09-05

2006-09-05

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298220, C204S298090

Reexamination Certificate

active

07101466

ABSTRACT:
A sweeping linear magnetron is described. The magnetron has a cathode backing plate, a drive housing attached to the cathode backing plate and a motor held in the drive housing. The motor drives a yoke positioned within a cut-out in the backing plate. The yoke has a magnet pack attached thereto said yoke such that the magnet pack is adapted to being moved over a target material and wherein the target material is being sputtered within a vacuum chamber onto a substrate.

REFERENCES:
patent: 5026471 (1991-06-01), Latz et al.
patent: 5865970 (1999-02-01), Stelter
patent: 6258217 (2001-07-01), Richards et al.
patent: 6322679 (2001-11-01), De Bosscher et al.
patent: 6641701 (2003-11-01), Tepman

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