Process equipment with simultaneous or sequential deposition and

Details Process equipment with simultaneous or sequential deposition and Process equipment with simultaneous or sequential deposition and

1995-12-04

1999-09-28

Housel, James C.

Coating apparatus

With vacuum or fluid pressure chamber

118719, 118729, 20429823, 20429825, 20429826, 2041921, 20419235, 156345, C23C 1600, C23C 1400, C23F 102

Patent

active

059581344

ABSTRACT:
Method and apparatus for forming the longitudinal edges of stacks of razor blades by conveying the stacks of razor blades along a conveying path in a vacuum chamber past material deposition and material etching stations. The material etching stations are mounted in the sides of the vacuum chamber to be directed generally toward the edge sides of the edges of the razor blades. In another embodiment, stacks of razor blades are mounted on opposite sides of a rotating pallet and material deposition and etching stations are mounted in both side walls of the vacuum chamber. A DC or RF bias is applied to the stacks of razor blades by capacitively coupling the RF bias or conducting by electrical contacts a DC or RF bias to a central portion of the rotating pallet.

REFERENCES:
patent: 3562140 (1971-02-01), Skinner et al.
patent: 3968018 (1976-07-01), Lane et al.
patent: 4626336 (1986-12-01), Bloomquist et al.
patent: 4663009 (1987-05-01), Bloomquist et al.
patent: 4722298 (1988-02-01), Rubin et al.
patent: 4749465 (1988-06-01), Flint et al.
patent: 4882028 (1989-11-01), Chhabra
patent: 5032243 (1991-07-01), Bache et al.
patent: 5048191 (1991-09-01), Hahn
patent: 5056227 (1991-10-01), Kramer
patent: 5088202 (1992-02-01), Boland et al.
patent: 5110249 (1992-05-01), Norman
patent: 5121660 (1992-06-01), Kramer
patent: 5129289 (1992-07-01), Boland et al.
patent: 5142785 (1992-09-01), Grewal et al.
patent: 5232568 (1993-08-01), Parent et al.
patent: 5377816 (1995-01-01), Deligi et al.
PCT Search Report, filed May 6, 1996, PCT/US96/08981.

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