4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Steven P. Bozeman

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Electrode designs for high pressure magnetically assisted induct

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent

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Method for plasma processing at high pressure

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Rounded top pole

Dynamic magnetic information storage or retrieval – Head – Core
Reexamination Certificate

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