4. Coating processes
  5. Direct application of electrical, magnetic, wave, or...
  6. Plasma

Sohyun Park

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Adhesion improvement for low k dielectrics

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Adhesion improvement for low k dielectrics

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method for depositing an amorphous carbon film with improved...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method to deposit functionally graded dielectric films via...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Oxide-like seasoning for dielectric low k films

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sohyun Park does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Sohyun Park, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sohyun Park will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2305913

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure