Carbon deposition by ECR CVD using a catalytic gas

Details Carbon deposition by ECR CVD using a catalytic gas Carbon deposition by ECR CVD using a catalytic gas

1988-07-08

1989-10-03

Beck, Shrive

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 47, 427 38, 427122, 423446, 118723, B05D 314

Patent

active

048715816

ABSTRACT:
A material consisting mainly of carbon can be formed on a surface by virtue of a microwave energy. A catalyst gas is introduced into a reaction chamber for ECR CVD, along with a carbon compound gas. The catalyst gas consists of a gaseous compound of germanium such as GeH.sub.4 and GeF.sub.4.

REFERENCES:
patent: 4434188 (1984-02-01), Kamo et al.

Affiliated with

Also associated with

Rating

Carbon deposition by ECR CVD using a catalytic gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Carbon deposition by ECR CVD using a catalytic gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Carbon deposition by ECR CVD using a catalytic gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-663177