4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Shuki Yamamori

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Method of fabricating staggered thin film transistor with an imp

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Patent

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Plasma CVD apparatus for forming a thin film of uniform thicknes

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Staggered thin film transistor with transparent electrodes and a

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent

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Profile ID: LFUS-PAI-P-667458

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