4. Coating apparatus
  5. Gas or vapor deposition

Seiki Takaya

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Apparatus for vaporizing and supplying organometal compounds

Coating apparatus – Gas or vapor deposition
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Method for vaporizing and supplying organometal compounds

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
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Profile ID: LFUS-PAI-P-1815736

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